Method for the deposition and modification of thin films using a

Details Method for the deposition and modification of thin films using a Method for the deposition and modification of thin films using a

1995-06-07

1996-12-03

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

20429841, 427580, C23C 1432

Patent

active

055804292

ABSTRACT:
Cathodic/anodic vacuum arc sources with plasma ion implantation deposition system for depositing high quality thin film coatings of complex compounds on a workpiece. Both cathodic and anodic vacuum arc deposition sources, CAVAD, are used to create a plasma vapor from solid materials composing the cathode and/or anode in the cathodic and/or anodic arc respectively. Gases, e.g., hydrogen or nitrogen can be in the deposited films by creating a background plasma of the desired gas using either RF energy, thermionic emission, or consequential ionization of the gas passing through the arc or around the substrate. Application of highly negative pulses to the substrate to extract the ions and provide them with the appropriate energy to interact with the other species in the thin film formation on the substrate to form the desired films. The substrate is bombarded with the ionized particles to form carbon nitrides with variable [N]/[C] ratios, referred to as CN.sub.x.

REFERENCES:
patent: 3158805 (1964-11-01), Kalbfell
patent: 4917786 (1990-04-01), Ehrich
patent: 4929322 (1990-05-01), Sue et al.
patent: 5013578 (1991-05-01), Brown et al.
patent: 5096558 (1992-03-01), Ehrich
patent: 5104509 (1992-04-01), Buck et al.
patent: 5279723 (1994-06-01), Falabella et al.
patent: 5401543 (1995-03-01), O'Neill et al.
patent: 5458754 (1995-10-01), Sathrum et al.
Bababeygy, S., "Corrosion Protection by Vacuum Arc Coatings," Interfinish 88, Paris, Oct. 1988.
Bacon, F. M., "Vacuum Arc Anode Plasma. I. Spectroscopic Investigation," Journal of Applied Physics, vol. 46., No. 11, Nov. 1975, pp. 4750-4757.
Boxman, R. L., et al., "Principles and Applications of Vacuum Arc Coatings," XIIIth Internation Symposium on Discharges and Electrical Insulation in Vacuum, Paris, 1988.
Ehrich, H., et al., "The Anodic Vacuum Arc. I. Basic Construction and Phenomenology," Jun. 1987, pp. 134-138.
Ehrich, H., et al., "The Anodic Vacuum Arc. II. Experimental Study of Arc Plasma," Sep. 1987, pp. 2499-2502.
Grissom, J. T., et al., "Anode Surface Radiance From Microsecond Vacuum Arcs," Journal of Applied Physics, vol. 45, No. 7, Jul. 1974, pp. 2885-2894.
Kimblin, C. W., "Anode Voltage Drop and Anode Spot Formation in dc Vacuum Arcs," Journal of Applied Physics, vol. 40, No. 4, Mar. 1969, pp. 1744-1752.
Miller, H. Craig, "A Review of Anode Phenomena in Vacuum Arcs," IEEE Transactions on Plasma Science, vol. PS-13, Oct. 1985, pp. 242-252.
Sroda, T., et al., "Plating-free metal ion implantation utilizing the cathodic vacuum arc as an ion source," Applied Physics Letters, vol. 60, 1076-1078 (1992).
Storer, J., et al., "Transport of Vacuum Arc Plasma Through Straight and Curved Magnetic Cuts," Journal of Applied Physics, vol. 66, No. 11, Dec. 1989, pp. 5245-5250.

Affiliated with

Also associated with

Rating

Method for the deposition and modification of thin films using a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the deposition and modification of thin films using a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the deposition and modification of thin films using a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-782305