Method for the critical water oxidation of organic compounds

Liquid purification or separation – Processes – Making an insoluble substance or accreting suspended...

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210761, 210808, C02F 172

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active

061031291

ABSTRACT:
A method for oxidizing organic material in an aqueous stream containing one or more inorganic salts, inorganic salt precursors or mixtures thereof comprises oxidizing the organic material in a reactor at a temperature at least equal to the critical temperature of the aqueous stream so as to form a single homogeneous fluid phase and at a pressure sufficiently high to solubilize the inorganic salts in the single homogeneous phase.

REFERENCES:
patent: 2665249 (1954-01-01), Zimmermann
patent: 2944396 (1960-07-01), Barton et al.
patent: 4292953 (1981-10-01), Dickinson
patent: 4338199 (1982-07-01), Modell
patent: 4543190 (1985-09-01), Modell
patent: 4822497 (1989-04-01), Hong et al.
patent: 5075017 (1991-12-01), Hossain et al.
patent: 5100560 (1992-03-01), Huang
patent: 5106513 (1992-04-01), Hong
patent: 5200093 (1993-04-01), Barner et al.
patent: 5232604 (1993-08-01), Swallow et al.
patent: 5240619 (1993-08-01), Copa et al.
patent: 5250193 (1993-10-01), Sawicki et al.
patent: 5252224 (1993-10-01), Modell et al.
Armellini et al., Experimental Methods For Studying Salt Nucleation & Growth From Supercritical Water, CA116:182446, J. Supercritical Fluids, 1991.

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