Method for the concentration determination of silane gas in a ga

Details Method for the concentration determination of silane gas in a ga Method for the concentration determination of silane gas in a ga

1986-10-21

1989-03-07

Richman, Barry S.

Chemistry: analytical and immunological testing

Silicon containing

436164, 472 83, G01N 3300, G01N 2100, G01N 700

Patent

active

048106542

ABSTRACT:
A very sensitive and reliable analytical method is proposed for the concentration determination of silane SiH.sub.4 in a gaseous mixture. In the method, the sample gas is admixed with ozone and irradiated with ultraviolet of a wave length of 200 to 320 nm so that a silicic aerosol is formed in the sample gas and the concentration of the silicic aerosol suspended in the sample gas is determined by the measurement of light scattering. Instead of the admixture of ozone, the sample gas containing or admixed with oxygen is first irradiated with ultraviolet of shorter than 200 nm wave length to convert the oxygen into ozone in situ and then the photochemical formation of silicic aerosol and light scattering measurement are undertaken as mentioned above.

REFERENCES:
Tao et al., Light Scattering Method Combined with Production of Fine Particles by Photochemical Reaction for Determination of Silane in Air, 5/86, pp. 1148-1152.

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