Method for the chemical vapor deposition of group IB and group V

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Process of making wire – tape – cable – coil – or fiber

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

505730, 505701, 505702, 505473, 427 62, 427250, 427125, 427124, 427123, B05D 512, C23C 1600

Patent

active

053526562

ABSTRACT:
A method for applying a metal film barrier layer between a substrate and a superconductor coating or over a superconductivity coating using chemical vapor deposition in which low vapor pressure reactants are used, is disclosed, which comprises the steps of providing a substrate and a quantity of metal-bearing reagent and one or more reagents, placing the substrate within the furnace, introducing the metal-bearing reagent by a powder feeder means and then the reagents at different times into and reacting them in the furnace, resulting in the deposition first of a coating of metal onto the substrate and then of a coating consisting essentially of the superconducting reactant components onto the metal film; said reagents generally chosen to yield the group of oxide superconductors.

REFERENCES:
patent: 4054686 (1977-10-01), Newkirk et al.
patent: 4202931 (1980-05-01), Newkirk et al.
patent: 4741928 (1988-05-01), Wilson et al.
patent: 4880670 (1989-11-01), Erbil
patent: 4975413 (1990-12-01), Satek et al.
patent: 5154862 (1992-10-01), Reagan et al.
Voorhoeve, R. J. H. et al., "Selective Deposition of Silver on Silicon by Reaction with Silver Fluoride Vapor", J. Electrochem. Soc., vol. 119, pp. 364-368 (Mar. 1972).
Anonymous, "Laser Chemical Vapor Deposition of Silver," Research Disclosure, vol. 363, p. 146 (Mar. 1986).
Oehr, C. et al., "Deposition of Silver Films by Plasma-Enhanced Chemical Vapour Deposition", Appl. Phys. A., vol. 59, pp. 691-696 (1989).
Mogro-Campero, A. et al., "Thickness and Annealing Dependence of the Superconducting Transition Temperature of YBa.sub.2 Cu.sub.3 O.sub.7-x Thin Films", Appl. Phys. Lett., vol. 53, p. 2566 (1988).
Fujino, K., "Effect of Indium-Tin Oxide Buffer Layers on Superconducting Y-Ba-Cu-O Thin Films with Glass Substrates".
Jpn. J. Appl. Phys., vol. 28, No. 2, pp. L236-L238 (Feb. 1989).
Truman, J. K. et al., "Investigation of SrTiO.sub.3 Barrier Layers for RF Sputter-Deposited Y-Ba-Cu-O Films on Si and Sapphire", Published by the Dept. of Materials Science and Engineering, University of Florida (1988).
Ma, Q. Y. et al., "Interdiffusion Between Si Substrates and YBaCuO Films," Reprint from materials distributed at International M.sup.2 S-HTSC Conference, Stanford, California (Jul. 1989).
Chen, J. M. et al., "Study of Interaction Between ZrO.sub.2 (YSZ) Substrates and YBa.sub.2 Cu.sub.3 O.sub.7-.delta. Superconducting Films", Appl. Phys. A., vol. 48, pp. 277-281 (1989).
Singh, R. et al., "Preparation of BaF.sub.2 Films by Metal Organic Chemical Vapor Deposition", Published by the School of Electrical Engineering and Computer Science, University of Oklahoma, Norman (1989).
Hollabough et al., "Chemical Vapor Deposition of ZrC Made by Reactions of ZrCl.sub.4 with CH.sub.4 and with C.sub.3 H.sub.6," Nod. Tech., vol. 35, No. 9, p. 527 (1977).
Gurvitch, M. et al., "Preparation and Substrate Reactions of Superconducting Y-Ba-Cu-O Films", Appl. Phys. Lett., vol. 51, No. 13, pp. 1027-1029 (Sep. 1987).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for the chemical vapor deposition of group IB and group V does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the chemical vapor deposition of group IB and group V, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the chemical vapor deposition of group IB and group V will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-581266

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.