Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1975-11-14
1977-07-26
Thomas, Earl C.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
423470, B01D 5334, C01C 116
Patent
active
040383695
ABSTRACT:
The present invention provides a method for reducing the amount of hydrogen chloride contained in a gas stream by reacting the hydrogen chloride with ammonia in the gas phase so as to produce ammonium chloride. The combined gas stream is passed into a condensation and collection vessel and a cyclonic flow is created in the combined gas stream as it passes through the vessel. The temperature of the gas stream is reduced in the vessel to below the condensation temperature of ammonium chloride in order to crystallize the ammonium chloride on the walls of the vessel. The cyclonic flow creates a turbulence which breaks off the larger particles of ammonium chloride which are, in turn, driven to the bottom of the vessel where the solid ammonium chloride can be removed from the vessel. The gas stream exiting from the condensation and collection vessel is further cleaned and additional ammonium chloride is removed by passing through additional filters.
REFERENCES:
patent: 1725292 (1929-08-01), Moore et al.
patent: 1776698 (1930-09-01), Moore et al.
patent: 1987572 (1935-01-01), Heath
patent: 3322659 (1967-05-01), Paquet
Thomas Thomas R.
Winston Steven J.
Carlson Dean E.
Fisher Robert J.
Jackson Frank H.
The United States of America as represented by the United States
Thomas Earl C.
LandOfFree
Method for the abatement of hydrogen chloride does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the abatement of hydrogen chloride, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the abatement of hydrogen chloride will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-726614