Method for temperature measurement in rapid thermal process syst

Details Method for temperature measurement in rapid thermal process syst Method for temperature measurement in rapid thermal process syst

1994-10-25

1997-02-11

Gutierrez, Diego F. F.

Thermal measuring and testing

Temperature measurement

In spaced noncontact relationship to specimen

374128, 374124, 374 9, G01J 510

Patent

active

056013663

ABSTRACT:
A method for obtaining real-time emissivity and temperature values of a semiconductor wafer in a processing system having at least one lamp (preferably a plurality of lamps arranged in a plurality of zones so as to provide multizone temperature and emissivity values for the semiconductor wafer) arranged in at least one zone, the method using a reference wafer having a known reflectivity and the method comprising the steps of: measuring pyrometry signals for the reference wafer (step 202) and generating calibration curves from the measurements; measuring pyrometry signals for the semiconductor wafer; and obtaining the temperature and emissivity values (step 222) from the calibration curves and the measured pyrometry signals (step 220) for the semiconductor wafer.

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