Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-02-09
1991-01-15
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118 501, 219 1055F, C23C 1648
Patent
active
049845349
ABSTRACT:
The following are disclosed:
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Kawarada, Jap. J. Applied Phys., vol. 26, No. 6, Jun. 1987, pp. L1032-1034.
Hosoya Ikuo
Ito Toshimichi
Nosaka Masaaki
Bueker Richard
Idemitsu Petrochemical Co. Ltd.
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