Method for surface treatment with extra-low-speed ion beam

Details Method for surface treatment with extra-low-speed ion beam Method for surface treatment with extra-low-speed ion beam

1995-01-09

1995-10-17

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

2504922, H01J 3700

Patent

active

054593263

ABSTRACT:
A method of treating the surface of a substrate using an extra-low-speed ion beam. The method involves forming a cluster, which is a lump-shaped group of atoms or molecules of a gaseous substance at the ambient temperature, by adiabatic expansion form a high pressure region into a high-vacuum region thorough a small-bore conical nozzle, pouring electrons onto the cluster, accelerating the thus generated cluster ions by acceleration voltage, and irradiating the ions onto the surface of a solid. The method permits surface cleaning of a substrate without causing damage or defects, ion injection into the very shallow surface layer portion, and CVD.

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patent: 5069967 (1991-12-01), Yokoyama et al.
patent: 5118950 (1992-06-01), Bahns et al.
patent: 5196102 (1993-03-01), Kumar

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