Method for structuring a lithography mask

Details Method for structuring a lithography mask Method for structuring a lithography mask

2006-02-28

2006-02-28

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000, C430S312000, C430S313000, C430S314000, C430S316000, C430S330000, C430S942000

Reexamination Certificate

active

07005220

ABSTRACT:
A method for structuring a lithograph mask by forming a cured, electrically-conductive layer on a mask structure having a radiation-transmissive substrate and a mask layer at least in portions of the surface of the radiation-transmissive substrate before applying a resist layer, so that during a subsequent irradiation of the resist layer by means of an electronic printing, the electrically conductive layer ensures a good charge elimination. By using a cured, electrically conductive layer, no intermixing effects between the electrically-conductive layer and the resist layer occur, and the electrically-conductive layer will be stable during subsequent development steps and not stripped off.

REFERENCES:
patent: 5126220 (1992-06-01), Tokitomo et al.
patent: 5242770 (1993-09-01), Chen et al.
patent: 5306601 (1994-04-01), Hashimoto et al.
patent: 5482799 (1996-01-01), Isao et al.
patent: 5821014 (1998-10-01), Chen et al.

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