Method for storage of silicon wafer

Details Method for storage of silicon wafer Method for storage of silicon wafer

1995-02-23

1996-01-16

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437250, 437946, 148DIG17, H01L 21302

Patent

active

054847486

ABSTRACT:
The single crystal silicon wafers which have undergone a treatment with a chemical liquid such as an acid or an alkali are stored without entailing contamination of their surfaces by causing the wafers to be immediately immersed, either directly or after being washed with water, in an aqueous hydrogen peroxide solution. The prevention of the contamination of surfaces of the wafers is attained effectively by setting the concentration of hydrogen peroxide in the aqueous hydrogen peroxide solution in the range of from 0.01 to 30% by weight and the temperature of the aqueous hydrogen peroxide solution at the time that the wafers are immersed in the solution in the range of from 10.degree. to 30.degree. C.

REFERENCES:
patent: 3383319 (1968-05-01), Black
patent: 5081068 (1992-01-01), Endo et al.
patent: 5294570 (1994-03-01), Fleming et al.
patent: 5352328 (1994-10-01), Obeng et al.
S. Wolf & R. N. Tauber, "Silicon Processing for the VLSI Era", 1986 vol. I, pp. 514-521, 531-535.
C. Okada, et al., Jpn. J. Appl. Phys., 32 (1993) L1031 "Accumulation of Organic Matter on Bare Si Wafer in Air".
M. Grunder, J. Vac. Sci. Technol., A5, 4 (1987) 2011 "HREELS Measurements on Hydrophilic Si (100) Wafers . . . ".

Affiliated with

Also associated with

Rating

Method for storage of silicon wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for storage of silicon wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for storage of silicon wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-309218