Method for stitching along the contours of patterns deposited on

Sewing – Elements – Frames

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1122623, 11212112, 112119, D05B 2100

Patent

active

047489200

ABSTRACT:
Difficulties are met with when contour-stitching patterns deposited on two-dimensional elastic fabrics because the originally printed or woven-in pattern is significantly warped already during printing or weaving and then during the clamping of the fabric in a clamping frame because of the fabric's elasticity. To make possible automatic contour-stitching, the invention proposes to feed the theroretical dimensional data of the pattern contours together with at least a few prominent sites into a memory of an electronic control for the automatic stitching machine and the actual dimensional data of at least those prominent sites are inputted by means of a computer in such a manner that the theoretical dimensional data are corrected relative to the actual positions of the pattern contours.

REFERENCES:
patent: 4262613 (1981-04-01), Landoni
patent: 4290375 (1981-09-01), Tonomura et al.
patent: 4446520 (1984-05-01), Shigeta et al.
patent: 4520745 (1985-06-01), Shinomiya et al.
patent: 4646246 (1987-02-01), Kinoshita et al.
patent: 4660484 (1987-04-01), Yasui
Bekliedunt+Wasche 21/1985, pp. 13-16 and 19-21.

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