Method for simulating deposition film shape and method for...

Details Method for simulating deposition film shape and method for... Method for simulating deposition film shape and method for...

2011-06-07

2011-06-07

Ghyka, Alexander G (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

C438S004000, C438S014000, C700S121000, C702S170000, C257SE21530

Reexamination Certificate

active

07955876

ABSTRACT:
A deposition film shape simulation method for calculating a thickness of a thin-film formed by supplying deposition species on a substrate surface, includes: changing a parameter to be used in the calculation depending on the thickness of the deposited thin-film.

REFERENCES:
patent: 5450205 (1995-09-01), Sawin et al.
patent: 5847973 (1998-12-01), Kumashiro
patent: 6913938 (2005-07-01), Shanmugasundram et al.
patent: 7195934 (2007-03-01), Aderhold et al.
patent: 7592254 (2009-09-01), Abelson et al.
patent: 2002/0045282 (2002-04-01), Opsal et al.
patent: 2002/0106819 (2002-08-01), Nozawa et al.
patent: 2004/0044419 (2004-03-01), Saki et al.
patent: 2007/0100553 (2007-05-01), Furuya
patent: 09-246189 (1997-09-01), None

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