Method for setting and adjusting process parameters to maintain

Details Method for setting and adjusting process parameters to maintain Method for setting and adjusting process parameters to maintain

1995-02-13

1997-07-08

Teska, Kevin J.

Boots, shoes, and leggings

364151, 36446824, 364490, G06F 1710, G06F 1750

Patent

active

056468709

ABSTRACT:
A method and system are disclosed for: (a) matching a machine-implemented process simulator with an actual fabrication line, (b) using the matched model to simulate the statistical results of mass production by the modeled production line, (c) using the model to predict cross-reticle variance from collected data for in-scribe features, (d) using the model to decompose the variance contributions of each process parameter and identify the more prominent contributors, and (e) using the model to identify the process parameter adjustments which would provide best leverage when taken one at a time.

REFERENCES:
patent: 4901242 (1990-02-01), Kotan
patent: 5111404 (1992-05-01), Kotani
patent: 5260865 (1993-11-01), Beanford et al.
patent: 5301118 (1994-04-01), Heck et al.
patent: 5319564 (1994-06-01), Smayling et al.
patent: 5341302 (1994-08-01), Connors et al.
patent: 5402367 (1995-03-01), Sullivan et al.
patent: 5438527 (1995-08-01), Feldbaumer et al.
patent: 5495417 (1996-02-01), Fuduka et al.
Dance et al., "Appl. of yield models for semiconductor yield improvement", Defect & Fault Tolerance on VLSI Systems, 1992 pp. 257-266.
Boning et al., "DOE/Opt: A Sys for Design of Experiments, Response Surface Modeling & Optimization Using Process & Device Simulation", IEEE Trans on Semiconductor Mfg. vol. 7, Iss. 2, May 1994, pp. 233-244.
Irauani et al., "Statistical Modeling Tools, Methods & Appl. for IC Mfg; Proc IEEE '95 Conf on Microelectronic Test Structures", vol. 8, Mar. 1995, pp. 203-207.
Williams et al., "Application of Process Statistics to Macro/Behavioral Modeling" IEEE 1993, pp. 515-518.
Pinto et al., "VLSI Tech Dev. by Predicture Simulation", 1993 IEEE pp. 29.1.1-29.1.4.
Duvall, "Towards a Practical Methodology for the Statistical Design of Complex IC Prod." 1993 VLSI TSA, pp. 112-116.
Boskin et al., "A Method for Modeling the Manufacturability of IC Designs", Proc IEEE Inf Conf on Microelectronics Test Structures, vol. 6, Mar. 1993, pp. 241-246.
Kizilyalli et al., "Predictive Worst Case Statistical Modeling of 0.8 .mu.
Bi CMOS Bipolar Transistors: A Methodology Based on Process & Mixed Device/Circuit Level Simulators", IEEE Trans. on Electron Devices, vol. 40, No. 5, May 1993, pp. 966-973.
Welton et al., "Statistical Worst-Case Simulator for CMOS Technolgy", IEE Colloq. No. 153: Improving the Efficiency of IC Mfg. Technology 1995.
Niu et al., "A Bayerian Approach to Variable Screening for Modeling the IC Fabrication Process", Circuits & Systems, 1995 IEEE Int'l Symposium, pp. 1227-1230.
Lopey-Serrano et al., "Yield Enhancement Prediction w/Statistical Process Simulations in an Advanced Polyemitter Complementary Bipolar Technology", IEEE 1994 Custom IC Conf, pp. 13.1.1-13.1.4.
Rietman et al., "Process Models & Network Complexity", 1993 Int'l Conf on Neural Networks, pp. 1265-1269.
Smith et al., "Comparison of scalar & vector diffraction modelling for deep-UV lithography", SPIE vol. 1927 Optical/Laser Microlithography VI--1993, pp. 847-857.
Dill et al., "Modelling Positive Photoresist", Proceedings of the Kodak Microelectronics Seminar, Oct. 1974, pp. 24-31.
Owen, "Controlling Correlations in Latin Hypercube Samples", 1994 Jour. Amer. Statistical Assoc., vol. 89 No. 428, Dec. 1994, pp. 1517-1522.
Heavlin, "Variance Components & Computer Experiments", Proceedings 1994 Amer. Statistical Assoc. pp. 103-108.
Mark, "Development of Positive Photoresicts", Jour Electrochen. Soc: Solid State Science & Tech. vol. 134 Iss 1, Jan. 1987, pp. 148-152.
Stein, "Large Sample Properties of Simultions Using Latis Hypercube Sampling", Technometrics, vol. 29, Iss. 2, May 1987, pp. 143-151.
Neureuther et al., "Photoresist Modelling & Device Fabrication Appl.," Optical & Acoustical Microelectronics, 1974, pp. 223-247.
Mandel, The Statistical Analysis of Experimental Data, John Wiley & Sons, 1964, Chap. 12, pp. 272-310.

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