Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Radioactive metal
Reexamination Certificate
2011-08-16
2011-08-16
Mayes, Melvin (Department: 1732)
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
Radioactive metal
C210S724000, C210S725000, C210S726000, C210S727000
Reexamination Certificate
active
07998439
ABSTRACT:
A separation and recycling method for recycling uranium and fluoride from a waste liquid sequentially and separately is disclosed. The method comprises a uranium-recycling process and a fluoride-recycling process. In the uranium-recycling process, an alkali metal compound or monovalent cation and a coagulant aid are added into the waste liquid to promote the precipitation of uranium. In the fluoride-recycling process, an alkaline earth metal compound, a strong acid and a coagulant aid are added into the uranium-removed waste liquid to precipitate fluoride. By means of the method of the present invention, the uranium and fluoride contents of the uranium-removed and fluoride-removed waste liquid are compliant with the effluent standards of the environmental laws.
REFERENCES:
patent: 4256702 (1981-03-01), Lyauder et al.
patent: 4769180 (1988-09-01), Echigo et al.
patent: 6419832 (2002-07-01), Van De Steeg et al.
J.A. Seneda, et al., Recovery of uranium from the filtrate of ammonium diuranate' prepared from uranium hexafluoride, Jrnl of Alloys & Compounds, 323-324, 2001, 838-841.
Lin Chen-Te
Pen Ben-Li
Tsao Kuo-Hao
Hudak, Shunk & Farine Co. LPA
Institute of Nuclear Energy Research
Mayes Melvin
Stalder Melissa
LandOfFree
Method for separating and recycling uranium and fluorine... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for separating and recycling uranium and fluorine..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for separating and recycling uranium and fluorine... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2641743