Coating processes – Coating by vapor – gas – or smoke – Metal coating
Patent
1987-06-30
1989-07-18
Childs, Sadie
Coating processes
Coating by vapor, gas, or smoke
Metal coating
427 99, 427251, 427253, 427255, 4272551, 4272557, 427404, 4274192, C23C 1606, C23C 1608
Patent
active
048492604
ABSTRACT:
A wafer, in which at least one via hole is made in an insulating film formed on the substrate, is held on a wafer holder in a reaction chamber under reduced pressure, WF.sub.6 gas is introduced into the reaction chamber so that a first metallic film of W is formed on the substrate in the via hole. The additional WF.sub.6 gas and H.sub.2 gas are introduced into the chamber and light from a heating lamp is directed onto the wafer such that a difference in temperature is created between the insulating film and the first metallic film such that a second metallic film of W is formed only on the first metallic film. The temperature difference is created because of the differences of the absorption ratios of infrared components of the light between the insulating film, the substrate and the first metallic film. The WF.sub.6 gas and H.sub.2 gas are made to flow in flat form substantially parallel to the surface of the wafer and an inert gas, such as Ar, is made to flow toward the surface of the wafer to control the flow of WF.sub.6 and H.sub.2.
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Ikuta Tetsuya
Kusumoto Yoshiro
Nakayama Izumi
Suzuki Akitoshi
Takakuwa Kazuo
Childs Sadie
Nihon Sinku Gijutsu Kabushiki Kaisha
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