Method for selective etching of flat panel display anode plate c

Details Method for selective etching of flat panel display anode plate c Method for selective etching of flat panel display anode plate c

1995-07-03

1997-10-07

Breneman, R. Bruce

Etching a substrate: processes

Forming or treating optical article

Phosphor screen

216 76, 216108, 445 24, 445 52, H01J 920

Patent

active

056744072

ABSTRACT:
A method of fabricating an anode plate 80 for use in a field emission device comprising the steps of providing a substantially transparent substrate 70, depositing a layer of a transparent, electrically conductive material 90 on a surface of the substrate, and then removing portions of said layer of conductive material to leave stripes of said conductive material 90.sub.R, 90.sub.G, 90.sub.B. The stripes of conductive material have a first and second corner 84, 88 distal from the substrate 70. The first and second corners 84, 88 of the stripes of conductive material are rounded and luminescent material 74 is applied on the conductive stripes 90. The first and second corners 84, 88 are rounded by applying voltage to the stripes 90 and then etching the stripes to form the rounded corners 84, 88.

REFERENCES:
patent: 3755704 (1973-08-01), Spindt et al.
patent: 4940916 (1990-07-01), Borel et al.
patent: 5194780 (1993-03-01), Meyer
patent: 5225820 (1993-07-01), Clerc
patent: 5342477 (1994-08-01), Cathey
patent: 5520563 (1996-05-01), Wallace et al.
patent: 5558554 (1996-09-01), Finklea et al.
patent: 5577943 (1996-11-01), Vickers et al.
IEEE Trans. Electr. Insul., Sudarshan, T.S., Cross, J.D., Srivastava, K.D., "Prebreakdown Processess Associated With Surface Flashover of Solid Insulators in Vacuum," pp. 200-208, Vool. E1-12, No. 3, Jun. 1977.
IEEE Trans. Electri. Insul., Tourreil, C.H., Srivastava, K.D., "Mechanism of Surface Charging of High-Voltage Insulators in Vacuujm," pp. 17-21, vol. E1-8, No. 1, Mar. 1973.

Affiliated with

Also associated with

Rating

Method for selective etching of flat panel display anode plate c does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for selective etching of flat panel display anode plate c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for selective etching of flat panel display anode plate c will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2354031