Method for selecting optical configuration for...

Details Method for selecting optical configuration for... Method for selecting optical configuration for...

2008-03-18

2009-10-13

Punnoose, Roy (Department: 2886)

Optics: measuring and testing

Dimension

C356S445000

Reexamination Certificate

active

07602509

ABSTRACT:
The present application discloses a method for selecting an optical configuration for a high-precision scatterometric measurement. A geometric parameterization of a grating is determined, wherein the grating comprises a periodic structure. The geometric parameterization is used to generate a representative set of model structures. An eigenvalue method is utilized to compute, for each model structure, a set of solutions which satisfy a Rayleigh condition within the grating. The Raleigh condition within the grating is satisfied when a vertical component of a propagating mode within the grating is zero. Other embodiments, features and aspects are also disclosed herein.

REFERENCES:
patent: 7333200 (2008-02-01), Sezginer et al.
patent: 7375831 (2008-05-01), Tanaka et al.
patent: 7385699 (2008-06-01), Mieher et al.
patent: 2008/0084567 (2008-04-01), Fabrikant et al.

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