Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Physical developing
Patent
1992-08-14
1994-05-03
Gellner, Michael L.
Radiation imagery chemistry: process, composition, or product th
Post imaging processing
Physical developing
430 24, G03B 4100, G03C 500
Patent
active
053091892
ABSTRACT:
The present invention is an improvement in a method of screening a line screen slit mask color picture tube that includes coating a faceplate panel of the tube with a photosensitive material, inserting a slit shadow mask into the panel and exposing the photosensitive material by passing light from a line light source through a misregister correction lens and through the slits of the mask. The improvement comprises positioning a skew correction lens between the line light source and the misregister correction lens during exposure of the photosensitive material. The skew correction lens has a surface with a general overall cylindrical shape with deviations from the cylindrical shape being in the four corners of the skew correction lens.
REFERENCES:
patent: 4049451 (1977-09-01), Law
patent: 4099848 (1978-07-01), Osakabe
patent: 4111694 (1978-09-01), Duistermaat et al.
patent: 4226513 (1980-10-01), Shimoma et al.
patent: 4516841 (1985-05-01), Ragland, Jr.
patent: 4568162 (1986-02-01), Ragland, Jr.
patent: 4586799 (1986-05-01), Hayashi et al.
patent: 4634247 (1987-01-01), Morrell et al.
Bauder Richard C.
Good Andrew
Marks Bruce G.
Ragland, Jr. Frank R.
Gellner Michael L.
Irlbeck Dennis H.
Lee Eddie C.
Thomson Consumer Electronics Inc.
Tripoli Joseph S.
LandOfFree
Method for screening line screen slit mask color picture tubes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for screening line screen slit mask color picture tubes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for screening line screen slit mask color picture tubes will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2118292