Method for retarding mineral buildup in downhole pumps

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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427 38, 427 39, C23C 1448, B05D 306

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active

049902334

ABSTRACT:
A method for retarding non-corrosive mineral build-up and plugging in check valves utilized with downhole reciprocating rod pumps, comprising ion implanting or ion plating the interior facing metal surfaces of the check valve with a nonferrous metal or metal oxide.

REFERENCES:
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patent: 4486247 (1984-12-01), Ecer et al.
patent: 4507189 (1985-03-01), Dol et al.
Dugdale et al., "Sputter ion plating", Welding Institute Reprint, Advanced In Surface Coating Technol., London, Feb. 13-15, 1978; pp. 53-60.
Dearnaley II, Thin Solid Films 107(1983), pp. 315-326; Sioshansi Thin Solid Films 118(1984), pp. 61-71.
Ohmae(I) Proc. 6th Intern. Vac. Cong. 1974; J. App. Phys. Supp. 2, Part I, 1974, pp. 451-454; Ohmae(II), J. Vac. Sci. Technol. 13 (1976); pp. 82-87.
Tsunasawa et al., J. Vac. Sci. Technol. 14 (1977), pp. 651-654; Eylon et al., Thin Solid Films 73 (1980), pp. 323-329.
Ohmae(III), Wear 30 (1974) pp. 299-309, Carlson et al.; IBM Tech. Disc. Bull. 22 (1979), pp. 3117-3118.

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