Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters
Patent
1992-03-09
1994-11-29
Strecker, Gerard R.
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Lumped type parameters
324715, 324724, 250306, G01R 2708
Patent
active
053693728
DESCRIPTION:
BRIEF SUMMARY
BACKGROUND OF THE INVENTION
A known technique for measurement of resistance on a semiconductor element is called a Spreading Resistance Probe (SRP). A semiconductor element is herein cut obliquely and the resistance between in each case two probe points placed on the surface is measured. These probe points or conductors are placed at an interval of approximately 15 to 50 .mu.m. The angle of inclination is in the region of several minutes to several degrees. The conductors are stepped over the obliquely cut portions with a step size in each case of 2.5 to 5 .mu.m. In the SRP technique the resistance measurement can take place with both direct voltage and alternating voltage.
A problem here is the deviation in the contact resistance between conductor and semiconductor element. The point of the conductor is accurately polished, which can sometimes take days, until the contact resistance on a calibration sample reaches a predetermined value. Even after the time-consuming calibration of the points of the conductors the deviation in the contact resistance results in inaccuracies in the measurements.
SUMMARY OF THE INVENTION
The present invention has for its object to provide a new method wherein the accuracy of resistance measurements on a semiconductor element is considerably improved.
For this purpose the invention provides a method for measuring the resistance or conductivity between two or more conductors which are placed against a semiconductor element, wherein in order to bring the contact resistance between the conductors and the element to, and hold it at, a predetermined value during measuring, the conductors are held at a constant distance and/or under constant pressure relative to the semiconductor element.
The preferred embodiments of the method (and the device) according to the present invention are disclosed and claimed herein.
BRIEF DESCRIPTION OF THE DRAWINGS
Further details, features and advantages of the present invention will become apparent in the light of the following description of a preferred embodiment according to the present invention with reference to the annexed drawings, in which:
FIG. 1 shows a graph of a current-voltage characteristic measured on a first semiconductor element and according to a first preferred method according to the present invention; and
FIG. 2 shows a graph of a current-voltage characteristic measured on a second semiconductor element and according to a second preferred method according to the present invention.
DETAILED DESCRIPTION
FIG. 1 and 2 are measured using an AFM arrangement (Atomic Force Microscopy). Herein a semiconductor element is movable three-dimensionally with piezo-crystals, a first of which adjusts the pressure or distance of a conducting needle relative to the semiconductor element, while two others enable a movement over the surface of the semiconductor element. A laser beam is directed onto the contact point of the conductor and the semiconductor element. The reflection of the laser beam is picked up by a photodiode, a the output of the photodiode is fed back to the first mentioned piezo-crystal.
In the measured graphs use is made of a tungsten wire of 20 .mu.m diameter which is cut to a point. The curve of FIG. 1 is measured on a semiconductor element with a relatively high resistivity, .rho..apprxeq.4.7 .OMEGA..cm. Applying a pressure force of constant value between the conductor and the semiconductor element results in an approximately linear current-voltage characteristic l.sub.1 at negative voltage and l.sub.2 at positive voltage.
FIG. 2 shows measurements on a substrate with a comparatively smaller resistivity .rho..apprxeq.0.0084 .OMEGA..cm. Different measurements are indicated with different curves in FIG. 2 and show an approximately linear relation (l.sub.3 and l.sub.4), wherein the angles of slope of the lines (l.sub.3 and l.sub.4) are dependent on the applied pressure between conductor and semiconductor element.
By applying the pressure between the semiconductor element and the conductor, this conductor penetrates throug
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Meuris Marc
Vandervorst Wilfried
Do Diep
Interuniversitair Micro Elektronica Centrum vzw
Strecker Gerard R.
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