Method for resist coating of a glass substrate

Details Method for resist coating of a glass substrate Method for resist coating of a glass substrate

1974-12-09

1976-04-20

Powell, William A.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

65 30R, 134 26, 156 15, 427299, C03C 1500

Patent

active

039516598

ABSTRACT:
A method for preparing the surface of a glass substrate so that resist maial may be directly applied to the surface and adhere thereto. The invention is particularly useful in the fabrication of relief masks used for pattern generation in planar thin film overlays, which masks are used to provide intimate contact between a photoresist surface and a masking pattern during exposure of the photoresist surface. The present method comprises cleaning of the glass substrate, boiling the substrate in trichloroethylene, and heating the substrate to between 160.degree. and 200.degree.C. Resist material may then be applied directly to the glass substrate.

REFERENCES:
patent: 3023139 (1962-02-01), Van Tetterode
patent: 3097961 (1963-07-01), Duperriez
patent: 3542612 (1970-11-01), Cashau et al.
patent: 3625728 (1971-12-01), Blome et al.
patent: 3764545 (1973-10-01), Aguadisch et al.
patent: 3911169 (1975-10-01), Lesaicherre et al.

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