Method for repairing photoresist layer defects using index...

Details Method for repairing photoresist layer defects using index... Method for repairing photoresist layer defects using index...

2005-10-24

2008-12-09

Kim, Paul D (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S417000, C029S603060, C029S603150, C204S192340, C204S192100, C360S230000, C360S237100, C438S455000, C438S458000, C438S946000, C451S005000, C451S041000

Reexamination Certificate

active

07461446

ABSTRACT:
A method is presented for repairing damaged photomasks for electronic component fabrication processes, particularly for fabrication of the ABS of a disk drive slider. The method includes applying an overcoat of material having index of fraction which is close to the index of refraction of the photoresist material of the damaged photomask to produce a non-scattering boundary surface. The overcoat material preferably includes an overcoat base material which is a polymer having an index of refraction which is in the range of plus or minus 0.1 from the index of refraction of said photoresist material.

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patent: 2005/0042554 (2005-02-01), Dierichs et al.

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