Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-05-29
2007-05-29
Toatley, Jr., Gregory J. (Department: 2877)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C356S433000, C356S448000
Reexamination Certificate
active
10748075
ABSTRACT:
A method is disclosed for repairing an opaque defect on a mask substrate. After examining one or more opaque patterns in a predetermined area of the mask substrate, at least one opaque defect in the opaque patterns is identified based on a difference between its light reflection rate and a reference reflection rate. A residue height of the opaque defect is further determined based on its light transmission rate, and a repair formula such as an etching dosage is devised based on the determined residue height.
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Chang Chi-Kang
Chen Chia-Hsien
Kung Chun-Hung
Lai Chian-Hun
Lin Wei-Lian
Duane Morris LLP
Taiwan Semiconductor Manufacturing Company
Toatley , Jr. Gregory J.
Valentin, II Juan D.
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