Method for repairing glass photomasks

Details Method for repairing glass photomasks Method for repairing glass photomasks

1981-09-25

1983-05-10

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 16, 65 301, 65 3013, 65 604, 427 141, 427 25, 427140, 4274432, 350314, 350319, G03F 500, C03C 1500, C03C 1700, G02B 522

Patent

active

043830161

ABSTRACT:
A method for repairing defects in the form of discontinuities in a photomask pattern in or on a glass substrate by means of electroless deposition of a nickel-containing coating on the surface of a glass substrate is disclosed.

REFERENCES:
patent: 2732298 (1956-01-01), Stookey
patent: 2911749 (1959-11-01), Stookey
patent: 2927042 (1960-03-01), Hall et al.
patent: 3561963 (1971-02-01), Kiba
patent: 3573948 (1971-04-01), Tarnopol
patent: 3620795 (1971-11-01), Kiba
patent: 3669770 (1972-06-01), Feldstein
patent: 3672939 (1972-06-01), Miller
patent: 3723158 (1973-03-01), Miller
patent: 3732792 (1973-05-01), Tarnopol et al.
patent: 4155735 (1979-05-01), Ernsberger
"One-Step Repair . . . Photodeposition", Ehrlich et al., IEEE Electron Device Letters vol. EDL-1, No. 6, 6/80, pp. 101-103.

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