Method for repairing a photomask, method for inspecting a...

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

Reexamination Certificate

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C430S311000, C430S945000, C382S144000

Reexamination Certificate

active

11478650

ABSTRACT:
A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.

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Japanese Notification of Reasons for Rejection Mailed Aug. 21, 2007 in corresponding application JP 2003-409607.
S. Wolf and R.N. Tauber, “Silicon Processing for the VLSI Era,” Lithography II: Optical Aligners and Photomasks, pp. 630-635, 2001.

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