Method for rendering imaging member substrates non-reflective

Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate

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252 791, 252 792, 252 795, 216106, C23F 100

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active

054297150

ABSTRACT:
A method of rendering nonreflective an imaging member substrate, preferably a photoreceptor substrate, involves etching the substrate with

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