Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent
1993-11-01
1995-07-04
Dang, Thi
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
252 791, 252 792, 252 795, 216106, C23F 100
Patent
active
054297150
ABSTRACT:
A method of rendering nonreflective an imaging member substrate, preferably a photoreceptor substrate, involves etching the substrate with
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Manzolati Richard J.
Maty David J.
O'Dell Gene W.
Perry Phillip G.
Thomas Mark S.
Dang Thi
Xerox Corporation
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