Method for removing water vapor from water vapor-containing gas

Gas separation – Means within gas stream for conducting concentrate to collector

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

55 68, B01D 5322

Patent

active

047189215

ABSTRACT:
A water vapor-containing gas is separated to a fraction thereof having an increased content of water vapor and a remaining fraction thereof having a decreased content of water vapor by a gas separating device which has at least one gas separating membrane having gas feed and delivery surfaces and a ratio P.sub.H.sbsb.2.sub.O /P.sub.CH.sbsb.4 of water vapor-permeating rate P.sub.H.sbsb.2.sub.O to methane gas permeating rate P.sub.CH.sbsb.4 of 200 or more, and preferably, made by an aromatic imide polymer, in such a manner that (1) a water vapor-containing feed gas is fed to a feed side of the gas separating device; (2) the feed gas is flowed along the gas feed surface of the gas separating membrane to allow a fraction of the feed gas to permeate through the gas separating membrane; (3) a drying gas containing 300 ppm or less of water vapor is fed to a delivery side of the gas separating device; (4) the fed drying gas is flowed along the delivery surface of the gas separating membrane to promote the permeation of water vapor through the gas separating membrane; (5) the permeated gas fraction is collected together with the flowed drying gas at the delivery side of the gas separating device; and (6) a remaining gas fraction not permeated through the gas separating membrane and having a decreased content of water vapor is recovered from the feed side of the gas separating device.

REFERENCES:
patent: Re30351 (1980-07-01), Hoehn et al.
patent: 3442002 (1969-05-01), Geary, Jr. et al.
patent: 3661724 (1972-05-01), Strickler
patent: 3735558 (1973-05-01), Skarstrom et al.
patent: 3735559 (1973-05-01), Salemme
patent: 3822202 (1974-07-01), Hoehn
patent: 4031012 (1977-06-01), Gics
patent: 4378400 (1983-03-01), Makino et al.
patent: 4440643 (1984-04-01), Makino et al.
patent: 4497640 (1985-02-01), Fournie et al.
patent: 4528004 (1985-07-01), Makino et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for removing water vapor from water vapor-containing gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for removing water vapor from water vapor-containing gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for removing water vapor from water vapor-containing gas will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-919534

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.