Method for removing resist pattern

Details Method for removing resist pattern Method for removing resist pattern

2006-09-12

2006-09-12

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

C430S260000

Reexamination Certificate

active

07105265

ABSTRACT:
A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent,a composition prepared by dissolving (A) an alkali soluble resin having a hydroxyl group in the side chain, (B) a photo acid generator and (C) a compound represented by the following general formula (I):in-line-formulae description="In-line Formulae" end="lead"?H2C═CH—O—R1—O—CH═CH2  (I)in-line-formulae description="In-line Formulae" end="tail"? wherein R1represents an alkylene group having 1 to 10 carbon atoms or the like, in an organic solvent being used as the chemically amplified positive resist composition, the method further having a heat treatment step of heat-treating the substrate on which the resist pattern is formed at a temperature of 150 to 400° C. between the resist pattern forming step and the removing step.

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