Method for removing residues formed during the manufacture...

Details Method for removing residues formed during the manufacture... Method for removing residues formed during the manufacture...

2006-07-17

2011-12-06

Norton, Nadine (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S706000, C438S734000

Reexamination Certificate

active

08071486

ABSTRACT:
A method of removing residues from an integrated device, in particular residues resulting from processing in HF vapor, is disclosed wherein the fabricated device is exposed to dry water vapor for a period of time sufficient to dissolve the residues in the dry water vapor.

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