Method for removing photoresist with solvent and ultrasonic agit

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

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134 13, 134 31, 134 38, 134 40, 510176, B08B 312, C23G 502

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active

056907478

ABSTRACT:
Liquid solvents having superior cleaning power include at least one polar compound having at least one strongly electronegative oxygen, such as ethylene diacetate, and at least one alicyclic carbonate, such as ethylene carbonate, with or without other additives. The solvents exhibit low toxicity; are nonflammable, pH neutral, essentially nonvolatile, and aprotic; and have other chemical and physical properties that reduce the risk of exposing the user unnecessarily to hazardous conditions. Solvents comprising ethylene carbonate, ethylene diacetate, and, optionally, triethanolamine and/or N-methyl-2-pyrrolidone are superior cleaners for a wide range of residues and are environmentally and physiologically safe.

REFERENCES:
patent: 2071920 (1937-02-01), Wurmbock
patent: 2932618 (1960-04-01), Oberdorfer
patent: 2935479 (1960-05-01), Oberdorfer
patent: 3150048 (1964-09-01), Hollub
patent: 3382181 (1968-05-01), Oberdorfer
patent: 3737386 (1973-06-01), Geiss
patent: 3796602 (1974-03-01), Briney et al.
patent: 4508634 (1985-04-01), Elepano et al.
patent: 4594111 (1986-06-01), Coonan
patent: 4617251 (1986-10-01), Sizensky
patent: 4645617 (1987-02-01), Vivian
patent: 4680133 (1987-07-01), Ward
patent: 4781916 (1988-11-01), Papaphilippou
patent: 4791043 (1988-12-01), Thomas et al.
patent: 4801331 (1989-01-01), Murase
patent: 4822723 (1989-04-01), Dhillon
patent: 5098594 (1992-03-01), Doscher
Bellamy et al. Infra-red Spectra and Solvent Effects, Part 2.--Carbonyl Absorptions, Trans. Farad. Soc. 55, pp. 14-18 (1959).
Maroncelli et al., Polar Solvent Dynamics and Electron-Transfer Reactions, Sci., vol. 243, pp. 1674-1680 (31 Mar. 1989).

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