Method for removing photoresist composition from substrate surfa

Details Method for removing photoresist composition from substrate surfa Method for removing photoresist composition from substrate surfa

1995-04-04

1997-06-10

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430189, 43027014, 430331, G03F 716

Patent

active

056374364

ABSTRACT:
Ternary mixtures of C.sub.4 to C.sub.8 alkyl acetate, C.sub.4 to C.sub.8 alkyl alcohol, and water, formulated to have a flash point of above 100.degree. F., are disclosed, particularly for use in edge residue removal processes in the fabrication of integrated circuits and like products.

REFERENCES:
patent: 3511178 (1970-05-01), Curtin
patent: 3896664 (1975-07-01), Alburger
patent: 4328304 (1982-05-01), Tachikawa et al.
patent: 4886728 (1989-12-01), Salamy et al.
patent: 5030550 (1991-07-01), Kawabe et al.
patent: 5106724 (1992-04-01), Nogami et al.
patent: 5151219 (1992-09-01), Salamy et al.

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