Method for removing photoresist

Details Method for removing photoresist Method for removing photoresist

1989-04-10

1990-10-30

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

C25F 500

Patent

active

049666649

ABSTRACT:
A method for removing photoresists, particularly those stressed during etching is provided. Pursuant to the method, an electrolysis is performed in order to promote basic decoating bath, wherein the substrate carrying the stressed photoresist structure is wired as a cathode. Gases arising directly at the substrate surface or, respectively, at the exposed metallic surfaces, effect a complete decoating the photoresist structure that at the same time is dissolving in the basic bath.

REFERENCES:
Clyde F. Coombs, Jr., Printed Circuits Handbook, Second Edition, McGraw-Hill Book Company, 1979, pp. 8-9-8-11.

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