Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-09-12
2009-02-03
Tran, Binh X (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S727000, C438S729000, C438S730000, C216S068000, C216S069000
Reexamination Certificate
active
07485580
ABSTRACT:
A process for removing organic electroluminescent residues from a substrate is described herein. The process includes the steps of providing a process gas comprising a fluorine-containing gas, optionally an oxygen-containing gas, and optionally an additive gas; activating the process gas in a remote chamber using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the organic electroluminescent residue from the surface.
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Dickenson John Bartram
Johnson Andrew David
Maroulis Peter James
Plishka Martin Jay
Rogers Steven Arthur
Air Products and Chemicals Inc.
Morris-Oskanian Rosaleen
Rossi Joseph D.
Tran Binh X
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