Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Reexamination Certificate
2008-04-29
2008-04-29
Vanoy, Timothy C. (Department: 1793)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
C423S392000, C423S393000, C502S300000, C502S325000, C502S355000, C502S305000, C502S527240, C422S129000, C422S211000
Reexamination Certificate
active
07364711
ABSTRACT:
N2O is removed in nitric acid manufacture by using catalysts comprising three-dimensional structures coated with catalytically active materials.
REFERENCES:
patent: 5250490 (1993-10-01), Ritscher et al.
patent: 5266546 (1993-11-01), Hearn
patent: 5314673 (1994-05-01), Anseth et al.
patent: 5478549 (1995-12-01), Koch
patent: 5612009 (1997-03-01), Fetzer et al.
patent: 6649134 (2003-11-01), Gorywoda et al.
patent: 6743404 (2004-06-01), Schumacher et al.
patent: 6890499 (2005-05-01), Schwefer
patent: 7192566 (2007-03-01), Duclos et al.
patent: 2002/0127932 (2002-09-01), Neumann et al.
patent: 2006/0008401 (2006-01-01), Hotta et al.
patent: 198 05 202 (1999-02-01), None
patent: 198 19 882 (1999-10-01), None
patent: 99/07638 (1999-02-01), None
patent: 01/87771 (2001-11-01), None
patent: 02/092196 (2002-11-01), None
Ullmann's Encyclopedia of Industrial Chemistry, 5thedition, vol. A17, pp. 294-339 1991.
Bender Michael
Kotrel Stefan
Wessel Helge
BASF - Aktiengesellschaft
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Vanoy Timothy C.
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