Method for removing moisture from chlorodifluoro-methane

Details Method for removing moisture from chlorodifluoro-methane Method for removing moisture from chlorodifluoro-methane

1996-03-13

1998-03-03

Siegel, Alan

Organic compounds -- part of the class 532-570 series

Organic compounds

Halogen containing

C07C 1738

Patent

active

057237026

ABSTRACT:
There is a process for removing moisture from chlorodifluoromethane (CHClF.sub.2) containing moisture in excess in the preparation of chlorodifluoromethane comprising lowering the partial pressure of water in the chlorodifluoromethane gas by contacting the chlorodifluoromethane gas with an aqueous solution of calcium chloride of more than 5% by weight.

REFERENCES:
Weissberger Separation and Purification Part 1, 2nd Ed, pp. 809, 816 (1956).
Encyclopedia of Chemical Technology, 3rd ed., 4:433, John Wiley & Sons (1984).
T.A. Wittstruck et al., "Some Hydrates of Some Halomethanes," J. Chem. Eng. Data, 6(3):343-346 (1961).

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