Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1997-07-23
1999-02-09
Warden, Jill
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 1, 134 13, 134 3, 134 26, 134 28, 134 29, 134 36, 134 31, 134 21, 134902, 436745, 436753, 436756, 436749, 436902, B08B 300
Patent
active
058688560
ABSTRACT:
A method of removing inorganic contamination from substantially the surface of a semiconductor substrate, the method comprising the steps of: reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent is included in a first supercritical fluid (preferably supercritical CO.sub.2); and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.
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Douglas Monte A.
Templeton Allen C.
Carrillo S.
Donaldson Richard L.
Hoel Carl H.
Texas Instruments Incorporated
Valetti Mark A.
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