Cleaning and liquid contact with solids – Processes – Gas or vapor condensation or absorption on work
Patent
1992-03-05
1993-12-21
Morris, Theodore
Cleaning and liquid contact with solids
Processes
Gas or vapor condensation or absorption on work
134 32, 134 33, B08B 500, B08B 700
Patent
active
052717747
ABSTRACT:
A method is set forth of removing a liquid (3) from a surface (2) of a substrate (1), which is placed in a centrifuge (4) and is then subjected therein to a rotary movement, the substrate being rotated at such a speed that the liquid is centrifuged from the surface. According to the invention, the substrate is brought into contact in the centrifuge with a vapour of a material which is miscible with the liquid and which, when mixed therewith, yields a mixture having a surface tension which is lower than that of the liquid. Due to this step, the quantity of material remaining on the surface is strongly reduced.
REFERENCES:
patent: 3957531 (1976-05-01), Tipping et al.
JP 60-113432, "Processing Equipment of Semiconductor", Patent Abstracts of Japan, No. 266 (E-352), vol. 9, p. 111, Oct. 23, 1985.
Huethorst Johanna A. M.
Leenaars Adriaan F. M.
Marra Johannes
El-Arini Zeinab
Miller Paul R.
Morris Theodore
U.S. Philips Corporation
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