Method for removing impurities of plasma display panel

Electric lamp or space discharge component or device manufacturi – Process – Including cleaning

Reexamination Certificate

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C445S005000, C445S006000, C445S025000

Reexamination Certificate

active

06986694

ABSTRACT:
In a method for removing impurities of a plasma display panel capable of shortening panel aging time by removing impurities of an upper and a lower substrates under vacuum gas circumstances, the method includes fabricating an upper substrate and a lower substrate; removing impurities of the upper and lower substrates by using at least one of a plasma-cleaning process in which a discharge is performed under vacuum gas circumstances and a heating process in which heating is performed; assembling the impurities removed upper and lower substrates; exhausting gas inside the assembled upper and lower substrates and injecting a discharge gas; and aging the discharge gas injected-plasma display panel.

REFERENCES:
patent: 4083614 (1978-04-01), Aboelfotoh et al.
patent: 6479944 (2002-11-01), Lee et al.
patent: 2002/0146959 (2002-10-01), Park et al.
patent: 01225127 (1989-09-01), None
patent: 03-257739 (1991-11-01), None
patent: 11-054038 (1999-02-01), None
patent: 2001-028241 (2001-01-01), None
patent: 2002-025443 (2002-01-01), None
patent: 2002025443 (2002-01-01), None
patent: WO 2003043751 (2003-05-01), None

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