Method for removing impurities from resist components and novola

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Treating polymer containing material or treating a solid...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

528481, 528482, 528492, 528502, 210638, 210660, 210661, 210679, 210681, 210683, 210685, 210686, 210692, C08F 608

Patent

active

053788028

ABSTRACT:
A method of removing ionic impurities from a resist component, comprising the steps of:

REFERENCES:
patent: 3067172 (1962-12-01), Carlstrom
patent: 3509084 (1970-04-01), Anspon et al.
patent: 4033909 (1977-07-01), Papa
patent: 4070313 (1978-01-01), Papa
patent: 4563425 (1986-01-01), Yoshioka et al.
patent: 4693828 (1987-09-01), Yoshioka et al.
patent: 4700723 (1987-10-01), Yoshikawa et al.
patent: 4965167 (1990-10-01), Salamy
Toray Product Brochure for TIN-100, TIN-200, and TIN-600 1 page only.
T. Yoshioka and M. Shimamura, "Studies of Polystyrene-based Ion Exchange Fiber. I. The Preparation and Fundamental Characteristics of Polystyrene-based Ion Exchange Fiber" Bull. Chem. Soc. Japan, 56, 3776-3729 (1983).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for removing impurities from resist components and novola does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for removing impurities from resist components and novola, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for removing impurities from resist components and novola will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2212399

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.