Gas separation: processes – Liquid contacting – In plural serial stages
Patent
1997-02-10
1998-02-10
Chiesa, Richard L.
Gas separation: processes
Liquid contacting
In plural serial stages
55267, 95227, 95288, B01D 4706
Patent
active
057164282
ABSTRACT:
A method for removing harmful substances of an exhaust gas discharged from a semiconductor manufacturing process. The method includes the steps of: removing at least one of a water-soluble component, a hydrolyzable component and dust contained in the exhaust gas discharged from semiconductor manufacturing equipment by water scrubbing; heating the water-scrubbed exhaust gas to thermally decompose a thermally-decomposable component contained therein and removing dust generated by the thermal decomposition from the thermally-decomposed exhaust gas by water scrubbing to render the thermally decomposed exhaust gas into a clean exhaust gas.
REFERENCES:
patent: 3052105 (1962-09-01), Bowan et al.
patent: 3997294 (1976-12-01), Kritzler
patent: 4467614 (1984-08-01), Tropeano et al.
patent: 4600561 (1986-07-01), Frei
patent: 5277707 (1994-01-01), Munk et al.
patent: 5405445 (1995-04-01), Kumada et al.
patent: 5567215 (1996-10-01), Bielawski et al.
patent: 5649985 (1997-07-01), Imamura
Heat Oxidation Decomposition Type for CVD Equipment Exhaust Gas Removal Equipment KT-1000 (brochure) Sumitomo Seika. Publication is believed to be Jul. of 1994. (Japanese and English Translations).
Chiesa Richard L.
Kanken Techno Co., Ltd.
LandOfFree
Method for removing harmful substances of exhaust gas discharged does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for removing harmful substances of exhaust gas discharged, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for removing harmful substances of exhaust gas discharged will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2073781