Method for removing foreign matter from substrate surface

Details Method for removing foreign matter from substrate surface Method for removing foreign matter from substrate surface

2006-10-24

2011-11-08

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001300, C134S002000, C134S003000, C134S026000

Reexamination Certificate

active

08052797

ABSTRACT:
A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which includes applying a light beam in a wavelength range which makes the light absorption coefficient of at least one of a material of the substrate, a material of the inorganic coating and the inorganic foreign matters be at least 0.01/cm, to the surface of the substrate or to the surface of the inorganic coating in an application amount of at least 10 J/cm2in an oxygen- or ozone-containing atmosphere, and exposing the surface of the substrate or the surface of the inorganic coating having a negative surface potential to an acidic solution having a pH ≦6.

REFERENCES:
patent: 5221423 (1993-06-01), Sugino et al.
patent: 5814156 (1998-09-01), Elliott et al.
patent: 6217665 (2001-04-01), Suzuki
patent: 6296714 (2001-10-01), Matsuo et al.
patent: 2004/0035153 (2004-02-01), Koike et al.
patent: 2004/0209194 (2004-10-01), Kume et al.
patent: 2005/0229946 (2005-10-01), Hirae et al.
patent: 0 859 404 (1998-08-01), None
patent: 3-120719 (1991-05-01), None
patent: 2002-131889 (2002-05-01), None
patent: 2003-71399 (2003-03-01), None
Kenji Masui, et al., “Ultra-fine Mask Cleaning Technology using Ultra-violet Irradiation”, SPIE, vol. 3412, Apr. 1998, pp. 447-454.
Jun-Fei Zheng, et al., “Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application”, SPIE, vol. 4186, 2001, pp. 767-773.
Hiroshi Sugawara, et al., “Photocleaning employing dielectric barrier discharge excimer lamp”, Summary of the Meeting for the Society of Chemical Engineers SD2-15, 1996, 4 Pages.
Shinichi Iso, et al., “Study of UV/O3 Cleaning Employing Xe2 Excimer Lamp”, Journal of the Illuminating Engineering Institute of Japan, vol. 83, No. 5, 1999, pp. 1-8.

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