Method for removing developing solution

Details Method for removing developing solution Method for removing developing solution

2008-05-06

2008-05-06

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

Reexamination Certificate

active

11111141

ABSTRACT:
An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.

REFERENCES:
patent: 6692164 (2004-02-01), Watanabe
patent: 6692165 (2004-02-01), Tanaka et al.
patent: 6770424 (2004-08-01), Mandal et al.
patent: 6777350 (2004-08-01), Nakagawa
patent: 7018481 (2006-03-01), Hayasaki et al.
patent: 56110940 (1981-09-01), None

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