Method for removing deleterious deposits from a surface

Details Method for removing deleterious deposits from a surface Method for removing deleterious deposits from a surface

1997-12-18

1999-10-05

Warden, Jill

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

510109, 510118, B08B 700, C11D 716

Patent

active

059617314

ABSTRACT:
A method for removing a scuff mark from a shoe surface made from a synthetic material comprises the steps of: applying a fingernail polish remover composition to the shoe surface with a cotton ball; rubbing the composition into the surface; and removing the scuff mark and the composition from the surface. The composition may consist essentially of acetone; water; glycerin; diglycerol; and gelatin. The composition may alternately consist essentially of ethyl acetate; isopropyl alcohol; water; benzophenone 1; isopropyl myristate; butyl acetate; and mineral salts containing sodium, potassium, magnesium, calcium, chloride, bromide, iodide, sulfate, and carbonate. Still further, the composition may alternately consist essentially of other nail polish remover compositions.

REFERENCES:
patent: 3702769 (1972-11-01), Vaughn
patent: 3955986 (1976-05-01), Miller
patent: 4208213 (1980-06-01), Muller et al.
patent: 4344932 (1982-08-01), Gordon
patent: 5227085 (1993-07-01), Motsenbocker
patent: 5403402 (1995-04-01), LeGrow
patent: 5639310 (1997-06-01), Giampaolo, Jr.

Affiliated with

Also associated with

Rating

Method for removing deleterious deposits from a surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for removing deleterious deposits from a surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for removing deleterious deposits from a surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1166573