Method for removing defects from chromium and chromium oxide pho

Details Method for removing defects from chromium and chromium oxide pho Method for removing defects from chromium and chromium oxide pho

1977-06-09

1978-08-08

Massie, Jerome W.

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 28, 156635, 156656, 219121LM, C23G 102

Patent

active

041054687

ABSTRACT:
Removal of selected, isolated defects comprised of excess chromium (Cr) or chromium oxide (Cr.sub.2 O.sub.3) from photomasks comprises contacting at least the defect area by a suitable acid and initiating the etch of the defect area by contacting the defect area with a metal probe made from a suitable material. Excess chromium or chromium oxide areas may be isolated by using a laser to separate the areas from areas which are to remain.

REFERENCES:
patent: 3539408 (1970-11-01), Cashau et al.
patent: 3673018 (1972-10-01), Dingwall
patent: 3947801 (1976-03-01), Bube

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