Method for removing contaminants from integrated circuits

Details Method for removing contaminants from integrated circuits Method for removing contaminants from integrated circuits

1999-01-15

2000-12-19

Bowers, Charles

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

438714, 438795, 134 13, 134 12, 216 67, 216 69, H01L 21302, H01L 21461

Patent

active

06162733&

ABSTRACT:
A method for removing contaminants from integrated circuit devices. Particularly disclosed is a method for removing alkali metal and halogen-based contaminants from an integrated circuit device as the device is being fabricated.

REFERENCES:
patent: 5380401 (1995-01-01), Jones et al.
patent: 5858878 (1999-01-01), Toda

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