Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1997-04-10
1999-06-22
Warden, Jill
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 3, 134 28, 134 29, 216 99, 438753, 438756, B08B 308, C23G 102, C23G 114
Patent
active
059139803
ABSTRACT:
A method for treating thin silicon web crystals used to produce solar cells in order to remove complex SiOx contaminants from the web after growth. A dendritic silicon web with {111} surface orientation is immersed in a caustic solution of KOH or NaOH at a temperature at a range from about 80 to about 85.degree. C. for a period of about five to about ten minutes. The caustic solution quickly removes the SiOx contaminants, while leaving relatively unaffected the silicon crystal in the surface. After the caustic solution treatment, the web is rinsed in deionized water and optionally subjected to an acid cleaning with HCL or HF in order to remove any residual contaminants on the web surface.
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Chaudhry Saeed
Ebara Solar, Inc.
Warden Jill
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