Method for removing a developer mix from a developing station

Details Method for removing a developer mix from a developing station Method for removing a developer mix from a developing station

1986-09-26

1990-06-12

Beck, Shrive

Coating apparatus

With means to apply electrical and/or radiant energy to work...

With electromagnetic and/or electrostatic removal of...

355246, G03G 1508

Patent

active

049323555

ABSTRACT:
An apparatus for removing a developer mix containing a magnetic component from a developing station of a non-mechanical printer or copier device. The developing station, at its lower portion, includes a channel-like discharge opening which extends over the full width of the developing station. A magnetic closing device is provided in the vicinity of the discharge opening, and functioning such that in its energized condition, its magnetic field acts on the developer mix to form a plug of developer mix in the region of the discharge opening which closes off the discharge opening. In the de-energized condition, the magnetic closing device releases the discharge opening whereupon the developing station is emptied by the action of a succeeding suction device such as a blower.

REFERENCES:
patent: 3685485 (1972-08-01), Kutsuwada et al.
patent: 3764208 (1973-10-01), Takahashi et al.
patent: 3784297 (1974-01-01), Ito et al.
patent: 3930466 (1976-01-01), Stover
patent: 4058086 (1977-11-01), Jugle et al.
patent: 4205911 (1980-06-01), Dole
patent: 4439034 (1984-03-01), Daniels
patent: 4451133 (1984-05-01), Kopp et al.
patent: 4459012 (1948-07-01), Allen et al.

Affiliated with

Also associated with

Rating

Method for removing a developer mix from a developing station does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for removing a developer mix from a developing station, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for removing a developer mix from a developing station will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-609860