Method for removal of pattern resist over patterned metal...

Details Method for removal of pattern resist over patterned metal... Method for removal of pattern resist over patterned metal...

2008-04-08

2008-04-08

Vinh, Lan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S706000, C438S710000, C134S001100, C134S001200

Reexamination Certificate

active

07354865

ABSTRACT:
A method of removing the pattern resist that remains on a microchip wafer after etching a patterned layer that is supported by a spacer layer. After the etch, the wafer is cleaned with a develop clean process that removes polymer residues from the pattern resist surface. Next is an ash to remove the hardened pattern resist surface, followed by removal of the pattern resist.

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