Method for removal of fungi formed on hides

Bleaching and dyeing; fluid treatment and chemical modification – Treatment of hides – skins – feathers and animal tissues – Treatment of untanned skins or hides

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

8 9415, 8108R, C14C 100, D06L 306

Patent

active

043903398

ABSTRACT:
Fungi growing on a hide are removed by immersing the hide in an aqueous solution of chlorinated isocyanuric acid or salt in a solution of chlorinated isocyanuric acid or salt in a halogenide of an aliphatic hydrocarbon having one to three carbon atoms or in a ketone or ester represented by the general formula: ##STR1## (wherein, R.sub.1 denotes an alkyl group having one to three carbon atoms and R.sub.2 an alkyl group or alkoxy group having one to three carbon atoms).

REFERENCES:
patent: 1596471 (1926-08-01), Wesenberg
patent: 2172233 (1939-09-01), Wilson
patent: 2998293 (1961-08-01), Damm et al.
patent: 3450483 (1969-06-01), Nordstrom
patent: 3919103 (1975-11-01), Berkowitz

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for removal of fungi formed on hides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for removal of fungi formed on hides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for removal of fungi formed on hides will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-932042

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.