Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Sulfur or sulfur containing component
Reexamination Certificate
2006-04-25
2006-04-25
Bos, Steven (Department: 1754)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Sulfur or sulfur containing component
C423S210000, C423S650000, C423S651000
Reexamination Certificate
active
07033557
ABSTRACT:
Method and apparatus are provided for removing contaminants from a hydrogen processor feed stream, as in a fuel cell power plant (110). Inlet oxidant (38), typically air, required by a catalytic hydrogen processor (34) in a fuel processor (14) for a fuel cell stack assembly (12) in the power plant (110), may contain contaminants such as SO2and the like. A cleansing arrangement, which includes an accumulator/degasifier (142, 46) acting as a scrubber, and possibly also a water transfer device (118), receives the inlet oxidant and provides the desired cleansing of contaminants. Water in the water transfer device and in the accumulator/degasifier serves to dissolve the water-soluble contaminants and cleanse them from the oxidant stream. The cleansed oxidant stream (138′) is then delivered to the hydrogen processor and to the fuel cell assembly, with minimal inclusion of detrimental contaminants such as sulfur.
REFERENCES:
patent: 5213912 (1993-05-01), Kumz et al.
patent: 5308456 (1994-05-01), Kunz et al.
patent: 6048383 (2000-04-01), Breault et al.
patent: 6207308 (2001-03-01), Grasso et al.
patent: 6221280 (2001-04-01), Anumakonda et al.
patent: 6299994 (2001-10-01), Towler et al.
patent: 6428916 (2002-08-01), Grasso et al.
patent: 6605378 (2003-08-01), Saito et al.
patent: 6610265 (2003-08-01), Szydlowski et al.
patent: 6645650 (2003-11-01), Meyer et al.
patent: 6787256 (2004-09-01), Matsui et al.
patent: 6890673 (2005-05-01), Higashiyama et al.
patent: 2002/0114747 (2002-08-01), Marchand et al.
patent: 2002/0160240 (2002-10-01), Matsui et al.
patent: 2003/0008187 (2003-01-01), Higashiyama et al.
patent: 2003/0031616 (2003-02-01), Szydlowski et al.
patent: 2004/0023096 (2004-02-01), Pratt et al.
patent: 2004/0035055 (2004-02-01), Zhu et al.
Dufner Bryan F.
Files Jay C.
Grasso Albert P.
Preston, Jr. John L.
Bos Steven
Hertzog Ardith E.
Schneeberger Stephen A.
UTC Fuel Cells LLC
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